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275
Catalyzed Surface-Aligned Reaction, H(ad)+H2(ad)=H2(g)+H(ad) on Coinage Metals
Zhanyu Ning, John C Polanyi
(submitted to Zeits. Phys. Chem.) doi:
274
Charge Delocalization Induces Reaction in Molecular Chains at a Surface
Zhanyu Ning, John C Polanyi
Angewandte Chemie International Edition,52, 320-324 (2013) doi:10.1002/anie.201207819
see also Supporting
Information
273
Single-Electron Induces Double-Reaction
Kai Huang, Lydie Leung, Tingbin Lim, Zhanyu Ning, John C Polanyi (To appear in Journal of the American Chemical Society) doi:
see also Supporting
Information
272
Adsorbate Alignment in Surface Halogenation: Standing Up is Better than Lying Down
Kai Huang, Iain R McNab, John C Polanyi, Jody (S. Y.) Yang Angewandte Chemie International Edition,
51, 9061-9065(2012) doi:10.1002/anie.201202772
see also Supporting
Information
271
Surface Aligned reaction(SAR)
Zhanyu Ning, John C Polanyi
Journal of Chemical Physics,137, 091706(2012) doi:10.1063/1.4746803
270
A new strongly-bound chemisorption structure of benzene on Si(100) Krishnan R. Harikumar, John C. Polanyi, Amir Zabet-khosousi
Surface Science ,
606, 1431-1434(2012) doi:10.1016/j.susc.2012.05.007
269
Effect of Alkyl Chain-Length on Dissociative Attachment: 1-Bromoalkanes on Si(100)- c(4x2) Maryam Ebrahimi, Si Yue Guo, Kai Huang, Tingbin Lim, Iain R.
McNab, Zhanyu Ning, John C. Polanyi, Mark Shapero, Jody (S. Y.) Yang
Journal of Physical Chemistry C, 116, 10129-10137(2012) doi:10.1021/jp301773m
see also Supporting
Information
268
Reaction dynamics at a metal surface; Halogenation of
Cu(110)
Alon Eisenstein, Lydie Leung, Tingbin Lim, Zhanyu Ning, John C Polanyi
Faraday Discuss. ,157,
337-353 (2012) doi:10.1039/C2FD20023F
267
Localized reaction at a smooth
metal surface: p-diiodobenzene at Cu(110)
Lydie Leung, Tingbin Lim, Zhanyu Ning, John C Polanyi Journal of the American Chemical Society 134, 9320-9326(2012). doi:10.1021/ja301608q
see also Supporting
Information
266
Pulsed-dosing controls self-assembly: 1-Bromopentane on Si(111)-7x7
Alon Eisenstein, K. R. Harikumar, Kai Huang, Iain R. McNab, John
C. Polanyi, Amir Zabet-Khosousi Chemical Physics Letters,527,1-6(2012) doi:10.1016/j.cplett.2011.12.052
265
Stereo-isomerism
controls surface reactivity;
1‑chloropentane-pairs on Si(100)-2×1.
K R Harikumar, Iain R McNab, John C Polanyi,
Amir Zabet-Khosousi, Chiara Panosetti,
Werner A Hofer Chemical
Communications,47,
12101-12103 (2011). doi:
10.1039/c1cc14117a
see also Electronic
Supplementary Information
264
Directed
long-range migratory reaction of benzene
on Si(100).
K R Harikumar, John C Polanyi , Amir
Zabet-Khosousi Journal of
Physical Chemistry C, 115, 22409-22414
(2011). doi:
10.1021/jp2066748
263
Facile
charge-displacement at silicon gives
spaced-out reaction.
Maryam Ebrahimi, Kai Huang, Xuekun Lu, Iain
R. McNab, John C. Polanyi, Zafar Waqar,
Jody (S. Y.) Yang, Haiping
Lin , Werner A. Hofer Journal of
the American Chemical Society, 133,
16560-16565(2011).
doi:
10.1021/ja205716t see also Supporting
Information
262
Molecular
calipers control atomic separation at a
metal surface.
Lydie Leung,Tingbin Lim, John C Polanyi
, Werner A. Hofer. Nano
Letters, 11 (10) 4113-4117 (2011). doi:
10.1021/nl2023788
261
Multiple
pathways of dissociative attachment: CH3Br
on Si(100)-2x1. Tingbin Lim, Iain R. McNab, John C
Polanyi, Hong Guo , Wei Ji Journal of the
American Chemical Society, 133,
11534-11539 (2011). doi:10.1021/ja201060z
260
Imprinting
atomic and molecular patterns. Iain
R.
McNab , John C Polanyi Chapter 4,
Atomic and molecular manipulation. Volume
Editors Andrew J. Mayne and Gerald
Dujardin,
'Frontiers of nanoscience' Series, General
Ed. R. Palmer, pp 79-120 (2011). doi:10.1016/B978-0-08-096355-6.00004-0
259
Directed
long-range molecular migration, energized
by surface reaction,
K R Harikumar, John C Polanyi, Amir
Zabet-Khosousi, Piotr Czekala, Haiping Lin
and Werner A Hofer Nature
Chemistry, 3,
400-408 (2011). doi:10.1038/nchem.1029
see also "Surface chemistry: Molecular
cart-wheeling" Joseph W. Lyding, Nature
Chemistry, 3,
341-342 (2011). doi:10.1038/nchem.1035
258
Imprinting
self-assembled patterns of lines at a
semiconductor surface, using heat, light,
or electrons.
K R Harikumar, Iain R McNab, John C Polanyi,
Amir Zabet-Khosousi , Werner A Hofer Proceedings
of the National Academy of Sciences,108,
950-955
(2011). doi:10.1073/pnas.1006657107
257
Surface-mediated
chain reactionthrough
dissociative attachment.
Tingbin Lim, John C Polanyi, Hong Guo ,
Wei Ji Nature
Chemistry, 3, 85-89 (2011). doi:10.1038/NCHEM.930
see also Article: Chris Adriaanse, 'Dangling
Bond Helps Grow Nanowires', Chemistry
& Industry, 1, January (2011).
see also News Article, 'Researchers grow
nano-scale patterns on silicon', Canadian
Chemical News, February (2011).
256
'Early’ and
'Late' Barriers in Dissociative
Attachment: Steering Surface Reaction.
Maryam Ebrahimi, Si Yue Guo, Iain R. McNab
, John C. Polanyi Journal of Physical Chemistry Letters,1,
2600-2605 (2010). doi:10.1021/jz100868n
see also Supporting
Information
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